CMOS芯片
光电子学
可靠性(半导体)
栅氧化层
材料科学
电气工程
电路可靠性
电压
逻辑门
电子线路
电子工程
计算机科学
工程类
晶体管
物理
功率(物理)
量子力学
作者
Ming‐Dou Ker,Tzu-Ming Wang,H.H. Liao
标识
DOI:10.1109/iscas.2008.4541544
摘要
A new 2xVDD-tolerant crystal oscillator circuit realized with 1xVDD CMOS devices without suffering gate-oxide reliability issue is proposed, which is one of the key mixed-voltage I/O cells in a cell library. The proposed circuit is realized with only thin gate-oxide devices with floating n-well technique. The proposed 2xVDD-tolerant crystal oscillator circuit has been designed and verified in a 90-nm 1-V CMOS process to serve 1/2-V mixed-voltage interface applications.
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