晶片切割
氟
等离子清洗
蚀刻(微加工)
氟碳化合物
溶剂
等离子体刻蚀
图层(电子)
材料科学
硅
铝
等离子体
模具(集成电路)
胶粘剂
化学工程
复合材料
纳米技术
化学
冶金
有机化学
工程类
量子力学
物理
作者
Mohd Akbar Md Sum,JeongPyo Hong
标识
DOI:10.1109/iemt55343.2022.9969476
摘要
BOSCH plasma dicing process switches between different plasma chemistries to provide fluorine-based etching of the silicon while protecting the sidewall of the growing feature with a fluorocarbon layer. Aluminum fluoride formed on the bond pad and fluorocarbon layer at the die side wall will cause critical problem during wire bonding. This study is mainly focus on cleaning method of spraying solvent for cleaning the fluorinated contamination and result was compared with existing cleaning process using DIW rinse. SEM EDS and AES analysis data showing the fluorinated material has been removed from the die will also be shown.
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