掺杂剂
电阻率和电导率
兴奋剂
分析化学(期刊)
材料科学
接受者
锰
霍尔效应
杂质
外延
氢化物
相(物质)
电子迁移率
凝聚态物理
化学
金属
冶金
纳米技术
光电子学
物理
有机化学
色谱法
图层(电子)
电气工程
工程类
作者
Daiki Tanaka,Kenji Iso,Jun Suda
摘要
The electrical properties of semi-insulating GaN substrates doped with iron (Fe), carbon (C), or manganese (Mn) grown by hydride vapor phase epitaxy are presented. Hall effect measurements were performed at temperatures ranging from 300 to 800 K. At all of the investigated temperatures, the Mn-doped samples exhibited the highest resistivity. The Fe-doped samples showed n-type conduction, whereas the C-doped samples and the Mn-doped sample with a Mn concentration of 1 × 1019 cm−3 showed p-type conduction. A detailed analysis of the temperature dependence of the carrier concentration showed that all of the impurities formed acceptor levels at EC −(0.59–0.61) eV for Fe, at EV +(0.90–1.07) eV for C, and at EV +1.55 eV for Mn. The Mn-doped sample with a Mn concentration of 8 × 1017 cm−3 showed a negative Hall coefficient (suggesting n-type conduction) at high temperatures, contradicting the formation of acceptor levels by Mn. We successfully explained the negative value by considering the conduction of both holes and electrons with different mobilities. On the basis of the results, we calculated the relationship between the resistivity and doping concentration for each dopant. The calculations indicated that the highest resistivity can be realized in Mn-doped GaN with an optimized doping concentration (depending on the residual donor concentration). All of the dopants can effectively realize high resistivity at room temperature. Mn is an effective dopant for attaining high resistivity, especially at high temperatures (e.g., 800 K).
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