材料科学                        
                
                                
                        
                            光致聚合物                        
                
                                
                        
                            全息术                        
                
                                
                        
                            纳米技术                        
                
                                
                        
                            工程物理                        
                
                                
                        
                            聚合物                        
                
                                
                        
                            光学                        
                
                                
                        
                            复合材料                        
                
                                
                        
                            聚合                        
                
                                
                        
                            物理                        
                
                                
                        
                            工程类                        
                
                        
                    
            作者
            
                Alexander J. Osterbaan,Andrew N. Sias,Marianela Trujillo‐Lemon,Kieran Fung,Jason P. Killgore,Robert R. McLeod,Christopher N. Bowman            
         
                    
        
    
            
            标识
            
                                    DOI:10.1021/acsami.5c04731
                                    
                                
                                 
         
        
                
            摘要
            
            In the writing of holographic photopolymers, the addition of a third-stage cure to the typical polyurethane matrix and acrylate writing monomer steps is used here to modify the ultimate thermomechanical properties of the final holographic photopolymer. Inclusion of a thermally latent, low-refractive-index epoxide homopolymerization increases the Tg from a value of -22 °C during the writing step to a final Tg of 101 °C after the epoxide cure. Critically, the diffraction grating structure is retained with high fidelity, an index contrast of 0.0057, and a diffraction efficiency of 89% achieved in these materials. Ultimately, the 3-stage design and final glassy nature of these materials promote thermal and dimensional stability of the final holographic material.
         
            
 
                 
                
                    
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