材料科学
光致聚合物
全息术
纳米技术
工程物理
聚合物
光学
复合材料
聚合
物理
工程类
作者
Alexander J. Osterbaan,Andrew N. Sias,Marianela Trujillo‐Lemon,Kieran Fung,Jason P. Killgore,Robert R. McLeod,Christopher N. Bowman
标识
DOI:10.1021/acsami.5c04731
摘要
In the writing of holographic photopolymers, the addition of a third-stage cure to the typical polyurethane matrix and acrylate writing monomer steps is used here to modify the ultimate thermomechanical properties of the final holographic photopolymer. Inclusion of a thermally latent, low-refractive-index epoxide homopolymerization increases the Tg from a value of -22 °C during the writing step to a final Tg of 101 °C after the epoxide cure. Critically, the diffraction grating structure is retained with high fidelity, an index contrast of 0.0057, and a diffraction efficiency of 89% achieved in these materials. Ultimately, the 3-stage design and final glassy nature of these materials promote thermal and dimensional stability of the final holographic material.
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