High-performance silicon-based n–i–p heterojunction photoanode for efficient photoelectrochemical water splitting: fabrication, optimization, and large-scale application

Silicon-based n–i–p heterojunction photoanode with a standard FTO/TiO 2 /Si/NiO architecture has been fabricated using earth-abundant materials, leveraging the advantage of the heterostructure for efficient photoelectrochemical water splitting.