光子学
拓扑绝缘体
极化(电化学)
物理
拓扑(电路)
光子晶体
对称保护拓扑序
拓扑量子数
拓扑序
光学
光电子学
量子
量子力学
化学
数学
物理化学
组合数学
作者
Jinyu Hu,Qianqian Wang,Jiebin Niu,Chong Wang,Tao Liu,Lina Shi,Yongliang Zhang,Xun Yang,Kai Chang
标识
DOI:10.1002/lpor.202300515
摘要
Abstract Topological protection in photonics offers new prospects for confining and guiding light waves. Up to now, most reported works on topological photonics have focused on the realization of topological phases originally found in condensed matter systems. However, photonic systems can possess a distinguishing topology that differs from their quantum electronic counterparts due to the vectorial nature of light. Here, dual‐polarization topological photonic states are theoretically predicted and experimentally demonstrated at optical frequencies on the all‐dielectric silicon‐on‐insulator platform. The topological band gaps opening at valleys for both TE‐ and TM‐polarizations in the properly designed breathing Kagome photonic crystal slabs are demonstrated, leading to dual‐polarization topological edge states below the light cone. The topological edge states are directly observed by imagining the near fields with scattering scanning near‐field microscopy. In addition, the significant improvement of the quality factor of topological states via engineering the transition near the boundary along with the robustness of edge states is presented. The proposed dual‐polarization topological states and the improvement of quality factor via boundary profile engineering paves the way toward novel applications of topological photonics for realizing integrated polarization‐dependent applications such as polarization multiplexing photonic devices and on‐chip chiral quantum optics.
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