深共晶溶剂
共晶体系
镍
氯化胆碱
材料科学
化学工程
电化学
透射电子显微镜
扫描电子显微镜
纳米结构
玻璃碳
电极
分析化学(期刊)
纳米技术
化学
循环伏安法
冶金
有机化学
物理化学
复合材料
工程类
合金
作者
El Amine Mernissi Cherigui,Kadir Sentosun,Mesfin Haile Mamme,Monika Łukaczyńska,Herman Terryn,Sara Bals,Jon Ustarroz
标识
DOI:10.1021/acs.jpcc.8b05344
摘要
The electrodeposition of nickel nanostructures on glassy carbon was investigated in 1:2 choline chloride urea (1:2 ChCl-U) deep eutectic solvent (DES) containing different amounts of water.By combining electrochemical techniques, with ex-situ FE-SEM, HAADF-STEM and EDX, the effect of water content on the electrochemical processes occurring during nickel deposition was better understood.At highly negative potentials and depending on water content, Ni growth is halted due to water splitting and the formation of a mixed layer of Ni/NiO x (OH) 2(1-x)(ads) .Moreover, under certain conditions, the DES components can also be (electro)chemically reduced at the electrode surface, blocking further 3D growth of the Ni NPs.Hence, a 2D crystalline Ni containing network can be formed in the inter-particle region.
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