晶体管
硅
材料科学
光电子学
过渡金属
工程物理
纳米技术
堆栈(抽象数据类型)
金属浇口
逻辑门
电气工程
计算机科学
工程类
栅氧化层
化学
生物化学
程序设计语言
电压
催化作用
出处
期刊:
[SPIE]
日期:2023-04-30
卷期号:: 502-502
被引量:3
摘要
We present the case for 2D transition metal dichalcogenides [TMD] replacing silicon transistors at ultra-scaled gate lengths. This new TMD 2D transistor technology has numerous clear advantages but experimentally there are still unsolved questions, therefore we will share both our current successes of high performance 2D transistors, as well as some of the current roadblocks. This talk includes a review of our progress in materials, contacts, gate stack and stacked gate all around 2D nanoribbons.
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