材料科学
光学
栅栏
切趾
衍射效率
波长
衍射光栅
折射率
制作
光电子学
闪耀光栅
硅
带宽(计算)
物理
计算机网络
计算机科学
医学
病理
替代医学
作者
Yuheng Liu,Lipeng Xia,Ting Li,Yuhan Sun,Peiji Zhou,Li Shen,Yi Zou
出处
期刊:Optics Letters
[Optica Publishing Group]
日期:2022-12-08
卷期号:48 (2): 239-239
被引量:19
摘要
We present, to our knowledge, the first experimental demonstration of two on-chip gratings for perfectly vertical coupling at wavelengths of 3350 nm and 3550 nm, respectively. An anti-backreflection unit containing a fully etched trench and a subwavelength pillar is introduced in each grating period, together with a binary-approximated blazed unit, interleaving fully and shallow-etched slots in 500-nm thick silicon film. Both gratings show a strong ability to eliminate backreflection and provide predicted directionality of around 80%. The physical theoretical analysis is applied during further apodization for mitigating the computation of the optimization algorithm, improving the efficiency and optimization reliability, and increasing the fabrication robustness. The measured coupling efficiencies (CEs) of the gratings are −5.58 dB and −4.34 dB at wavelengths of 3350 nm and 3550 nm, with a 3-dB bandwidth of at least 87 nm and 210 nm, respectively.
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