杂质
材料科学
空位缺陷
Atom(片上系统)
图层(电子)
厚板
曲面(拓扑)
表面能
金属
化学物理
表层
原子物理学
能量(信号处理)
结合能
凝聚态物理
分子物理学
纳米技术
冶金
化学
物理
复合材料
嵌入式系统
有机化学
量子力学
计算机科学
数学
地球物理学
几何学
作者
Jiancai Liu,Zhang Xin-ming,Chen Ming-an,Tang Jian-guo,Shengdan Liu
出处
期刊:Chinese Physics
[Science Press]
日期:2010-01-01
卷期号:59 (8): 5641-5641
被引量:3
摘要
A new vacancy model by using periodic density functional theory was used to describe the process of In segregation from clean Al surfaces via atomic movement through vacancies. The detailed segregation mechanism of impurity metal In to Al (001) surface planes is examined, carefully evaluating energy barriers for each step in the segregation process. The results show that the system energy is decreased by 0.46 eV and the highest energy barrier is 0.34 eV when the impurity atom In moves from the second layer to the topmost layer in the Al (001) slab. The system energy is almost constant when impurity atoms segregate from the third layer to the second layer. Higher energy (0.65 eV) was needed to overcome the energy barriers. So, In showing a strong segregation to the clean Al (001) surface is thermodynamically favorable.
科研通智能强力驱动
Strongly Powered by AbleSci AI