电致发光
发光二极管
光电子学
材料科学
单层
波长
二极管
异质结
发射光谱
光发射
宽禁带半导体
半最大全宽
分子束外延
薄膜
量子效率
双异质结构
光致发光
量子阱
量子点
受激发射
自发辐射
砷化镓
谱线
绿灯
光学
梁(结构)
等离子体
量子
作者
S. M. Islam,Kevin Lee,Jai Verma,Vladimir Protasenko,Sergei Rouvimov,Shyam Bharadwaj,Huili (Grace) Xing,Debdeep Jena
摘要
Electrically injected deep ultra-violet emission is obtained using monolayer thin GaN/AlN quantum structures as active regions. The emission wavelength is tuned by controlling the thickness of ultrathin GaN layers with monolayer precision using plasma assisted molecular beam epitaxy. Single peaked emission spectra are achieved with narrow full width at half maximum for three different light emitting diodes operating at 232 nm, 246 nm, and 270 nm. 232 nm (5.34 eV) is the shortest electroluminescence (EL) emission wavelength reported so far using GaN as the light emitting material and employing polarization-induced doping.
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