Preparation and electrochemical application of an AgNW/graphene/SU‐8 composite conductive photoresist

Abstract Photoresists play an increasingly important role in industrial fields like micro‐electro mechanical systems, micromachining, and chip packaging. However, the traditional one‐component photoresist is insulated, and additional steps are required to make it conductive, which complicates the process and limits its application. In order to solve the problem, we establish a one‐step strategy to build conductive composite photoresist. Herein, graphene (GR) and silver nanowire (AgNW) are doped into SU‐8 photoresist to fabricate a photo‐patternable conductive composite. The composite photoresist is employed to make micro‐patterns on an ITO electrode using photolithography, followed by electrochemical reduction of copper nanoparticles (CuNPs) to produce a nonenzymatic sensing coating. Experimental results prove that the response current of the obtained sensor is linearly related to the concentration of hydrogen peroxide in the range of 1–25 mM. The sensitivity and detection limit of the sensor are 41.8 μA mM −1 cm −2 and 9 μM, respectively. Moreover, excellent sensing performance including anti‐interference, repeatability, and stability demonstrates the potential application of CuNPs/AgNW/GR/SU‐8 composite material in electrochemical sensing.