氮化镓
光电子学
材料科学
晶体管
宽禁带半导体
高电子迁移率晶体管
电压
半导体
绝缘体(电)
氮化物
铟镓氮化物
电气工程
纳米技术
工程类
图层(电子)
作者
M. Fernández,X. Perpiñà,Jaume Roig-Guitart,M. Vellvehı́,F. Bauwens,M. Tack,X. Jordà
标识
DOI:10.1109/tie.2017.2719599
摘要
This paper studies by experimentation and physics-based simulation the Short-Circuit (SC) capability of several normally-off 600-650 V Gallium Nitride High-Electron-Mobility Transistors (GaN HEMTs): cascodes, p-GaN, and GaN Metal-Insulator-Semiconductor HEMTs (MISHEMTs). As a result, cascodes present the worst SC ruggedness. By contrast, p-GaN gate HEMTs and MISHEMTs provide a higher SC capability thanks to their strong drain current reduction. In addition, a valuable state-of-the-art about all commercially available technologies is also provided, which demonstrates that current GaN devices do not allow SC capability.
科研通智能强力驱动
Strongly Powered by AbleSci AI