Structural evolution and thermoelectric properties of Mg3SbxBi2−x thin films deposited by magnetron sputtering

Mg3Bi2-based compounds are of great interest for thermoelectric applications near room temperature. Here, undoped p-type Mg3SbxBi2−x thin films were synthesized using magnetron sputtering (three elemental targets in Ar atmosphere) with a growth temperature of 200 °C on three different substrates, namely, Si as well as c- and r-sapphire. The elemental composition was measured with energy-dispersive x-ray spectroscopy and the structure by x-ray diffraction. The electrical resistivity and the Seebeck coefficient were determined under He atmosphere from room temperature to the growth temperature. All samples are crystalline exhibiting the La2O3-type crystal structure (space group P-3m1). The observed thermoelectric response is consistent with a semiconductive behavior. With increasing x, the samples become more electrically resistive due to the increasing bandgap. High Bi content (x < 1) is thus beneficial due to lower resistivity and a higher power factor near room temperature. Thermoelectric thin films synthesized at low temperatures may provide novel pathways to enable flexible devices on polymeric and other heat-sensitive substrates.