Deposition of antireflective coatings on 3D micro-optics using atomic layer deposition

Laser 3D nanolithography enables the fabrication of complex shape micro-optical elements. The freedom of multi-surface designs of such components has cost them to suffer from reflection losses. This work presents the deposition of an Antireflective (AR) coating, using Atomic Layer Deposition (ALD), on hybrid organic-inorganic polymer SZ2080™ microstructures and micro-lenses fabricated using Laser Direct Writing (LDW). The single-wavelength AR coating produced using ALD successfully reduced reflection from 3.3 % to 0.1 % at 633 nm for one surface of SZ2080™.