肖特基势垒
晶体管
材料科学
二硫化钼
光电子学
接触电阻
肖特基二极管
图层(电子)
纳米技术
电气工程
电压
复合材料
二极管
工程类
作者
Han Liu,Mengwei Si,Yuanyuan Deng,Adam T. Neal,Yuchen Du,Sina Najmaei,Pulickel M. Ajayan,Jun Lou,Peide D. Ye
出处
期刊:ACS Nano
[American Chemical Society]
日期:2013-12-23
卷期号:8 (1): 1031-1038
被引量:221
摘要
In this article, we study the properties of metal contacts to single-layer molybdenum disulfide (MoS2) crystals, revealing the nature of switching mechanism in MoS2 transistors. On investigating transistor behavior as contact length changes, we find that the contact resistivity for metal/MoS2 junctions is defined by contact area instead of contact width. The minimum gate dependent transfer length is ∼0.63 μm in the on-state for metal (Ti) contacted single-layer MoS2. These results reveal that MoS2 transistors are Schottky barrier transistors, where the on/off states are switched by the tuning of the Schottky barriers at contacts. The effective barrier heights for source and drain barriers are primarily controlled by gate and drain biases, respectively. We discuss the drain induced barrier narrowing effect for short channel devices, which may reduce the influence of large contact resistance for MoS2 Schottky barrier transistors at the channel length scaling limit.
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