X射线光电子能谱
等离子体
化学计量学
衍射
硅
原位
氧化态
谱线
材料科学
稀土
氧气
基态
分析化学(期刊)
化学
原子物理学
光电子学
环境化学
光学
物理
物理化学
核磁共振
冶金
金属
天文
有机化学
量子力学
作者
Andreas Schaefer,S. Gevers,Volkmar Zielasek,Thomas Schroeder,J. Falta,J. Wollschläger,M. Bäumer
摘要
A cold radio frequency oxygen plasma treatment is demonstrated as a successful route to prepare clean, well-ordered, and stoichiometric PrO(2) layers on silicon. High structural quality of these layers is shown by x-ray diffraction. So far unobserved spectral characteristics in Pr 3d x-ray photoelectron (XP) spectra of PrO(2) are presented as a fingerprint for praseodymia in its highest oxidized state. They provide insight in the electronic ground state and the special role of praseodymia among the rare earth oxides. They also reveal that former XP studies suffered from a significant reduction at the surface.
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