Nitrogen Investigation by SIMS in Two Wide Band-Gap Semiconductors: Diamond and Silicon Carbide

Diamond and Silicon Carbide (SiC) are promising wide band-gap semiconductors for power electronics, SiC being more mature especially in term of large wafer size (200 mm). Nitrogen impurities are often used in both materials for different purpose: increase the diamond growth rate or induce n-type conductivity in SiC. The determination of the nitrogen content by secondary ion mass spectrometry (SIMS) is a difficult task mainly because nitrogen is an atmospheric element for which direct monitoring of N ± ions give no or a weak signal. With our standard diamond SIMS conditions, we investigate 12 C 14 N - secondary ions under cesium primary ions by applying high mass resolution settings. Nitrogen depth-profiling of diamond and SiC (multi-) layers is then possible over several micrometer thick over reasonable time analysis duration. In a simple way and without notably modifying our usual analysis process, we found a nitrogen detection limit of 2x10 17 at/cm 3 in diamond and 5x10 15 at/cm 3 in SiC.