次级电子
电子
二次排放
扫描电子显微镜
辐照
电子束处理
俄歇电子能谱
原子物理学
电子束诱导沉积
能量色散X射线光谱学
航程(航空)
阴极射线
电子光谱学
材料科学
产量(工程)
俄歇效应
微量分析
分析化学(期刊)
化学
螺旋钻
物理
核物理学
复合材料
有机化学
色谱法
摘要
The so-called “total yield” approach often fails to explain the measured sign of the surface potential, VS, and the shift of the nominal critical energy EC2∘ (where δ°+η°=1) of electron irradiated insulators. Here, a simple modification of this approach consists in including some extra interactions of the secondary and backscattered electrons with the electron traps generated previously by the irradiation itself. The trends in the evolution of the total yield, δ+η, and of VS as a function of the irradiation time (from their initial values up to their steady values) are then deduced for a wide primary beam energy range (1–50 keV) and for different external collector (or specimen holder) bias. New mechanisms are suggested for the contrasts observed in insulators investigated in scanning electron microscopy (SEM). The present analysis applies for a wide variety of electron beam techniques (SEM, Auger electron spectroscopy, and electron probe microanalysis) operated on a wide variety of insulating specimens and this analysis can be easily extended to any device based on the electron emission from insulators.
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