锡
氮化钛
材料科学
等离子体子
表面等离子共振
光电子学
氮化物
纳米颗粒
纳米技术
冶金
图层(电子)
作者
P. Patsalas,N. Kalfagiannis,S. Kassavetis
出处
期刊:Materials
[Multidisciplinary Digital Publishing Institute]
日期:2015-05-29
卷期号:8 (6): 3128-3154
被引量:333
摘要
Titanium nitride (TiN) is one of the most well-established engineering materials nowadays. TiN can overcome most of the drawbacks of palsmonic metals due to its high electron conductivity and mobility, high melting point and due to the compatibility of its growth with Complementary Metal Oxide Semiconductor (CMOS) technology. In this work, we review the dielectric function spectra of TiN and we evaluate the plasmonic performance of TiN by calculating (i) the Surface Plasmon Polariton (SPP) dispersion relations and (ii) the Localized Surface Plasmon Resonance (LSPR) band of TiN nanoparticles, and we demonstrate a significant plasmonic performance of TiN.
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