材料科学
对偶(语法数字)
光电子学
电流(流体)
领域(数学)
宽禁带半导体
氮化镓
电气工程
复合材料
工程类
图层(电子)
艺术
文学类
数学
纯数学
作者
Ryo Yamaguchi,Y. Suzuki,Joel T. Asubar,Hirokuni Tokuda,Masaaki Kuzuhara
标识
DOI:10.1109/imfedk.2017.7998058
摘要
This paper describes suppression of current collapse by field-plate (FP) in AlGaN/GaN MOS-HEMTs. Current collapse reduction was confirmed for a multi-gate fingered MOS-HEMT with a total gate width of 10 mm. Moreover, we have fabricated a 5-A class MOS-HEMT with both gate-FP and source-FP (dual-FP), showing more complete suppression in current collapse as compared to that with only gate-FP.
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