沟槽
材料科学
MOSFET
热失控
碳化硅
电压
可靠性(半导体)
光电子学
失效模式及影响分析
电气工程
工程类
复合材料
晶体管
电池(电)
功率(物理)
物理
图层(电子)
量子力学
作者
Yuan Zou,Jue Wang,Hongyi Xu,Hengyu Wang
出处
期刊:Materials
[Multidisciplinary Digital Publishing Institute]
日期:2022-01-13
卷期号:15 (2): 598-598
被引量:3
摘要
In this paper, the short-circuit robustness of 1200 V silicon carbide (SiC) trench MOSFETs with different gate structures has been investigated. The MOSFETs exhibited different failure modes under different DC bus voltages. For double trench SiC MOSFETs, failure modes are gate failure at lower dc bus voltages and thermal runaway at higher dc bus voltages, while failure modes for asymmetric trench SiC MOSFETs are soft failure and thermal runaway, respectively. The shortcircuit withstanding time (SCWT) of the asymmetric trench MOSFET is higher than that of the double trench MOSFETs. The thermal and mechanical stresses inside the devices during the short-circuit tests have been simulated to probe into the failure mechanisms and reveal the impact of the device structures on the device reliability. Finally, post-failure analysis has been carried out to verify the root causes of the device failure.
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