X射线
X射线光刻
平版印刷术
光学
材料科学
物理
抵抗
纳米技术
图层(电子)
作者
V.S. Chumak,Sergey Peredkov,A. Yu. Devizenko,I. А. Kopylets,Y. P. Pershyn
标识
DOI:10.1088/1361-6439/ad2f48
摘要
Abstract Application of X-ray multilayers as reflective X-ray masks (RXMs) for X-ray lithography is proposed. The mask is a specially prepared multilayer mirror capable to selectively reflect X-rays. The use of grazing geometry allows a pattern design on the mask to be compressed in one direction. Application examples are given for the masks (WC/Si multilayers) with two types of a radiation source: an X-ray tube (λ=0.154 nm) and a synchrotron (λ~0.35 nm). The compression of the mask segments by 14-30 times with the imprint size in the resist plane 3.5-4 μm is obtained. The advantages of the proposed masks are given. The possibilities of obtaining submicron imprints are discussed.
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