Electron thermometry for Si MOS inversion layer using proximity nano-transistor and its application to Joule-heating experiment

A method for measuring the electron temperature in the inversion layer of Si metal-oxide-semiconductor structures is presented. This technique utilizes a nano-transistor as a thermometer, placed in close proximity to the inversion layer under investigation, enabling measurements of the electron temperature for values above approximately 10 K. When applied to Joule-heating experiments, this method reveals a notable discrepancy between the measurement results and predictions made by the conventional theory based on the deformation-potential coupling with low-energy acoustic phonons. Specifically, the injected-power dependence of the electron temperature is much weaker than expected. The results strongly suggest that another mechanism causing a significant electron energy loss plays a role.