材料科学
无定形固体
光电探测器
光电子学
结晶学
化学
作者
Kai Peng,Difei Xue,Wei Lin,Peiwen Lv
标识
DOI:10.1016/j.mssp.2024.108491
摘要
Amorphous Ga2O3 thin films were deposited on SiO2 and sapphire substrates by pulsed magnetron sputtering (PSD) at room temperature, respectively. Corresponding amorphous Ga2O3 thin film photodetectors were prepared. The oxygen vacancies and defects of the interface between films and substrates were found to determine the discrepancy by comparing the performance between these two photodetectors. Amorphous Ga2O3 photodetectors on SiO2 had highly performances with a responsivity of 417 A/W, detectivity of 7.84 × 1012 Jones, and external quantum efficiency of 2.01 × 105 %.
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