辐照
材料科学
离子
稳健性(进化)
光电子学
辐射硬化
重离子
分析化学(期刊)
物理
电气工程
化学
核物理学
工程类
色谱法
生物化学
量子力学
基因
作者
Feng Zhou,Can Zou,Tianyang Zhou,Weizong Xu,Fangfang Ren,Dong Zhou,Yiwang Wang,Dunjun Chen,Yuanyang Xia,Leke Wu,Yiheng Li,Tinggang Zhu,Youdou Zheng,Rong Zhang,Hai Lu
标识
DOI:10.1109/led.2024.3386799
摘要
This work demonstrates the robust single-event irradiation hardness in 650-V E-mode p-GaN HEMTs with source-connected buried metal structure. Such device design notably contributes to the removal of irradiation-induced holes accumulated in the reverse-biased p-GaN/AlGaN/GaN (p-i-n) junction region, thereby improving irradiation robustness against single-event burnout (SEB). The resulting device exhibits significantly improved SEB voltages of 558 and 467 V under heavy ion linear energy transfer ( LET ion ) conditions of 75.7 and 86.3 MeV·cm 2 /mg, respectively, setting a new performance record for GaN-based power devices. Moreover, based on pulsed laser equivalent heavy ion irradiation system configured with a power switching circuit, a high power conversion efficiency of 95% is demonstrated under 77.6 LET PL , 300 W/500 kHz conditions. This work thus makes a significant step toward reaching the promise of GaN devices for radiation applications.
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