Prognostication of two-dimensional transition-metal atoms embedded rectangular tetrafluorotetracyanoquinodimethane single-atom catalysts for high-efficiency electrochemical nitrogen reduction

催化作用 过电位 过渡金属 电化学 单层 氮气 金属 吸附 化学 密度泛函理论 Atom(片上系统) 选择性 材料科学 纳米技术 物理化学 计算化学 电极 有机化学 嵌入式系统 计算机科学
作者
Shengyao Lv,Guoliang Li,Li‐Ming Yang
出处
期刊:Journal of Colloid and Interface Science [Elsevier BV]
卷期号:621: 24-32 被引量:25
标识
DOI:10.1016/j.jcis.2022.04.005
摘要

Extensive investigations on the electrocatalytic nitrogen reduction reactions (eNRR) and the high-efficiency single-atom catalysts (SACs) have increasingly given us confidence in intensive arrival of nitrogen (N2) fixation into ammonia (NH3) under ambient conditions in the future, which prompts us to speed up the exploration for highly active SACs for eNRR. Excellent SACs in eNRR should have three advantages: high selectivity, low overpotential, and high stability. Based on these aspects, we employed high-throughput screening method and first-principles calculations to study the catalytic performance of 30 transition-metal atoms (TMs) embedded rectangular tetrafluorotetracyanoquinodimethane (denoted as TM-rF4TCNQ) monolayers (TM = 3d, 4d, and 5d series transition metal atoms) for the eNRR process, and four potential catalysts, i.e., Ti-, Mo-, Nb-, and Tc-rF4TCNQ, were obtained. Among them, Ti-rF4TCNQ catalyzing the N2 reduction to NH3 through an enzymatic mechanism needs a theoretical onset potential of only -0.41 V. When Mo-rF4TCNQ catalyzes eNRR through a distal mechanism, the theoretical onset potential is as low as -0.43 V. The band structures show that these materials are all metallic, ensuring good charge transport during the eNRR process. Analyzing the projected density of states (PDOSs) before and after N2 adsorption, the differential charge density, and the spin density reveals that the Ti-, Mo-, Nb-, and Tc-rF4TCNQ monolayers all can effectively adsorb and activate inert N2, which may be mainly attributed to the "acceptance-donation" interaction between TM and N2.
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