Effect of resonance charge exchange between argon ions on the effective sputtering rate in a magnetron discharge

The sputtering rates of various materials in a magnetron ion sputterer are compared. The effective sputtering yields obtained when argon is used as a working gas are given. The difference between the sputtering yields found in this work and those obtained with monoenergetic ion beams is shown to be associated with resonance charge exchange between argon ions and neutral argon gas.