Methodology for the investigation of threading dislocations as a source of vertical leakage in AlGaN/GaN-HEMT heterostructures for power devices

阴极发光 材料科学 异质结 高电子迁移率晶体管 泄漏(经济) 位错 光电子学 透射电子显微镜 宽禁带半导体 晶体管 凝聚态物理 复合材料 纳米技术 电压 电气工程 物理 宏观经济学 工程类 发光 经济
作者
Sven Besendörfer,Elke Meißner,A. G. Lesnik,Jochen Friedrich,A. Dadgar,Tobias Erlbacher
出处
期刊:Journal of Applied Physics [American Institute of Physics]
卷期号:125 (9) 被引量:41
标识
DOI:10.1063/1.5065442
摘要

In this work, an AlGaN/GaN-HEMT heterostructure is exemplarily studied by a strict place-to-place correlational approach in order to help clarify some open questions in the wide field of reliability topics. Especially, vertical leakage current, its relation to dislocations in general, and specific types in particular are investigated on a highly defective material. With the aid of atomic force microscopy (AFM) in tapping mode, cathodoluminescence imaging, defect selective etching, and energy dispersive X-ray, the material’s defect content around the device relevant two dimensional electron gas is analyzed. The total dislocation density, as well as the density of threading screw, edge, and mixed type dislocations, is systematically investigated directly. The obtained result is statistically much more significant than is possible by conventional transmission electron microscopy studies and more precise than the results obtained by the indirect method of rocking curve analysis. The method of conductive AFM allowed mapping of variations in the vertical leakage current, which could be correlated with variations in barrier leakage or gate leakage. Spots of locally high leakage current could be observed and directly assigned to dislocations with a screw component, but with significant differences even within the same group of dislocation types. The electrical activity of dislocations is discussed in general, and a fundamental model for a potential dislocation driven vertical leakage is proposed.
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