Ferryl Ion in the Photo-Fenton Process at Acidic pH: Occurrence, Fate, and Implications

化学 环境化学 过程(计算) 芬顿反应 降级(电信) 光化学 环境科学 过氧化氢 有机化学 计算机科学 电信 操作系统
作者
Guowei Deng,Zhen Wang,Jinxing Ma,Jin Jiang,Di He,Xianhui Li,Aleksandra Szczuka,Zhong Zhang
出处
期刊:Environmental Science & Technology [American Chemical Society]
卷期号:57 (47): 18586-18596 被引量:33
标识
DOI:10.1021/acs.est.2c06373
摘要

Fenton processes produce reactive species that can oxidize organic compounds in natural and engineered systems. While it is well-documented that Fenton reactions produce hydroxyl radical (HO•) under acidic conditions, we demonstrated the generation of ferryl ion (FeIVO2+) in the UV/Fe(III) and UV/Fe(III)/H2O2 systems at pH 2.8 using methyl phenyl sulfoxide (PMSO) as the probe compound. Moreover, we clarified that FeIVO2+ is parallelly formed via the oxidation of Fe(III) by HO• and the O-O homolysis of [FeIII-OOH]2+ in the photo-Fenton process. The rate constant for the reaction between HO• and Fe3+ measured by laser flash photolysis was 4.41 × 107 M-1 s-1. The rate constant and quantum yield for thermal and photo O-O homolysis of [FeIII-OOH]2+ complex were 1.4 × 10-2 s-1 and 0.3, respectively, which were determined by fitting PMSO2 formation. While FeIVO2+ forms predominantly through the reaction between HO• and Fe3+ in the absence of H2O2, the relative contribution of [FeIII-OOH]2+ O-O homolysis to FeIVO2+ formation highly depends on the molar ratio of [H2O2]0/[Fe(III)]0, the level of HO• scavenging, and incident irradiance in the UV/Fe(III)/H2O2 system. Accordingly, an optimized kinetic model was developed by incorporating FeIVO2+-involved reactions into the conventional photo-Fenton model, which can accurately predict Fe(II) formation and contaminant decay in the UV/Fe(III) and UV/Fe(III)/H2O2 systems. Our study illuminated the underlying formation mechanism of reactive oxidative species in the photo-Fenton process and highlighted the role of FeIVO2+ evolution in modulating the iron cycle and pollutant abatement therein.
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