A New Method to Fabricate Attenuated Phase-shifting Mask with Photoresist Shifter

A new method of making attenuated phase-shifting mask with photoresist shifter is proposed.The principle and manufacturing process of the method are described.The fabricated masks with this method are used for exposure experiments with the system of KrF excimer laser projection photolithography.The exprimental results have proved that the attenuated phase-shifting masks with photoresist shifter are able to improve the resolution of the photolithography evidently.