Metal Assisted Focused-Ion Beam Etching for High-Fidelity Fabrication of Nanophotonic Devices
作者
Akash Kannegulla,Li‐Jing Cheng
出处
期刊:Conference on Lasers and Electro-Optics日期:2017-01-01卷期号:XIII: ATh3B.5-ATh3B.5
标识
DOI:10.1364/cleo_at.2017.ath3b.5
摘要
We report an MAFIB technique that significantly improves the fidelity of nanofabrication that allows direct milling of nanostructures on various materials with fine edges and smooth surfaces. The technique supports precise fabrication of nanophotonic devices.