材料科学
光电子学
二极管
阻塞(统计)
泄漏(经济)
紫外线
激光器
图层(电子)
光学
计算机科学
复合材料
物理
计算机网络
宏观经济学
经济
作者
Mengshuang Yin,Aoxiang Zhang,Yuan Xu,Fang Wang,Juin J. Liou,Yuhuai Liu
标识
DOI:10.1109/sslchinaifws57942.2023.10071110
摘要
In this paper, the thickness of the hole blocking layer(HBL) is optimized to reduce the hole leakage in the n-type region and improve the operating performance of the DUV-LD. The simulation of 12nm, 13nm, 14nm and 15nm thick HBLs was carried out by Crosslight software. By analyzing the energy band diagrams, P-I characteristics and V-I characteristics of the four structures, it is concluded that the 14 nm thick HBL can effectively reduce the hole leakage and has better optoelectronic performance.
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