铁电性
材料科学
缩放比例
制作
纳米技术
光电子学
电介质
数学
几何学
医学
病理
替代医学
作者
Xiao Liu,Xiangshun Geng,Houfang Liu,Minghao Shao,Ruiting Zhao,Yi Yang,Tian‐Ling Ren
出处
期刊:Tsinghua Science & Technology
[Tsinghua University Press]
日期:2022-09-29
卷期号:28 (2): 221-229
被引量:12
标识
DOI:10.26599/tst.2021.9010096
摘要
The discovery of ferroelectricity in hafnium oxide (HfO 2 ) based thin films in 2011 renewed the interest in ferroelectrics. These new ferroelectrics possess completely different crystal morphology with conventional perovskite ferroelectrics, and present more robust ferroelectric properties upon aggressive scaling and compatibility with standard integrated circuit fabrication processes. In this article, we give a brief introduction to the conventional ferroelectric memories, then review the basic properties, recent progress, and memory applications of these HfO 2 -based ferroelectrics.
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