背板
材料科学
AMOLED公司
光刻
兴奋剂
语调(文学)
光电子学
过程(计算)
薄膜晶体管
纳米技术
计算机硬件
计算机科学
图层(电子)
有源矩阵
操作系统
文学类
艺术
作者
in young Chung,G.Y. Kim,Hyunsik Yoon
标识
DOI:10.1149/2162-8777/ad1f90
摘要
Abstract In this work, the large AMOLED Display Backplane LTPS 5Mask PA method was studied. A storage cap was formed by doping boron on the poly Si under the GI cap in the contact hole process without using a storage cap doping mask. In the contact hole process, half-tone PR was used to simultaneously perform cap doping and TFT source drain open. Because half-tone PR must remain uniform to protect the cap lead-in end with GI uniformly within 8G Glass, photolithography PR process conditions with good half-tone uniformity were set up.
科研通智能强力驱动
Strongly Powered by AbleSci AI