Highly Efficient Photocatalytic Elimination of Bacteria and Antibiotic Resistance Genes via a Strong Oxidation Surface in Donor‐Acceptor SA‐PDI@C 60

Abstract The elimination of antibiotic‐resistant bacteria (ARB) and their antibiotic resistance genes (ARGs) requires photocatalysts with strong oxidative surfaces and efficient charge separation under natural light. Herein, a novel donor‐acceptor (D‐A) supramolecular photocatalyst, SA‐PDI@C 60 , is reported for natural light‐driven antibacterial application. The D‐A structure of SA‐PDI@C 60 amplifies the interfacial electric field (IEF) (≈1.96 times) and promotes efficient carrier separation and migration along π–π stacked pathways, leading to the accumulation of holes at the catalyst surface. This generates a highly oxidative antibacterial interface enriched in multiple reactive oxygen species. As a result, SA‐PDI@C 60 achieves 100% inactivation of Escherichia coli , Staphylococcus aureus , and ARB within 2 h under sunlight, accompanied by irreversible ARG degradation within 4 h, thereby preventing horizontal gene transfer. Proteomic analyses reveal that ROS‐induced oxidative stress disrupted DNA replication, aerobic respiration, and energy metabolism, ultimately causing bacterial death. This study demonstrates a D‐A photocatalyst with a highly active surface and effective IEF‐driven charge separation, offering a promising strategy for photocatalytic antibacterial action and ARG elimination under natural light.