光电探测器
异质结
光电子学
材料科学
暗电流
范德瓦尔斯力
比探测率
二硫化钼
二硫化钨
石墨烯
光电流
红外线的
响应度
光学
纳米技术
物理
量子力学
分子
冶金
作者
Yunfeng Chen,Yang Wang,Zhen Wang,Yue Gu,Yan Ye,Xuliang Chai,Jiafu Ye,Yan Chen,Runzhang Xie,Yi Zhou,Zhigao Hu,Qing Li,Lili Zhang,Fang Wang,Peng Wang,Jinshui Miao,Jianlu Wang,Xiaohong Chen,Wei Lü,Peng Zhou
标识
DOI:10.1038/s41928-021-00586-w
摘要
Unipolar barrier structures are used to suppress dark current in photodetectors by blocking majority carriers. Designing unipolar barriers with conventional materials is challenging due to the strict requirements of lattice and band matching. Two-dimensional materials have self-passivated surfaces and tunable band structures, and can thus be used to design unipolar barriers in which lattice mismatch and interface defects are avoided. Here, we show that band-engineered van der Waals heterostructures can be used to build visible and mid-wavelength infrared unipolar barrier photodetectors. Our nBn unipolar barrier photodetectors, which are based on a tungsten disulfide/hexagonal boron nitride/palladium diselenide heterostructure, exhibit a low dark current of 15 pA, a photocurrent of 20 μA and a detectivity of 2.7 × 1012 cm Hz1/2 W−1. Our pBp unipolar barrier photodetectors, which are based on a black phosphorus/molybdenum disulfide/graphene heterostructure, exhibit a room-temperature detectivity of 2.3 × 1010 cm Hz1/2 W−1 in the mid-wavelength infrared region under blackbody radiation. The pBp devices also show a dichroic ratio of 4.9 under blackbody radiation, and a response time of 23 μs under 2 μm laser illumination.
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