锐钛矿
材料科学
铂金
光催化
催化作用
X射线光电子能谱
退火(玻璃)
化学工程
纳米技术
无机化学
复合材料
化学
有机化学
工程类
作者
Seyedsina Hejazi,Shiva Mohajernia,Benedict Osuagwu,Giorgio Zoppellaro,Pavlína Andrýsková,Ondřej Tomanec,Štěpán Kment,Radek Zbořil,Patrik Schmuki
标识
DOI:10.1002/adma.201908505
摘要
Abstract Single‐atom (SA) catalysis is a novel frontline in the catalysis field due to the often drastically enhanced specific activity and selectivity of many catalytic reactions. Here, an atomic‐scale defect engineering approach to form and control traps for platinum SA sites as co‐catalyst for photocatalytic H 2 generation is described. Thin sputtered TiO 2 layers are used as a model photocatalyst, and compared to the more frequently used (001) anatase sheets. To form stable SA platinum, the TiO 2 layers are reduced in Ar/H 2 under different conditions (leading to different but defined Ti 3+ ‐O v surface defects), followed by immersion in a dilute hexachloroplatinic acid solution. HAADF‐STEM results show that only on the thin‐film substrate can the density of SA sites be successfully controlled by the degree of reduction by annealing. An optimized SA‐Pt decoration can enhance the normalized photocatalytic activity of a TiO 2 sputtered sample by 150 times in comparison to a conventional platinum‐nanoparticle‐decorated TiO 2 surface. HAADF‐STEM, XPS, and EPR investigation jointly confirm the atomic nature of the decorated Pt on TiO 2 . Importantly, the density of the relevant surface exposed defect centers—thus the density of Pt‐SA sites, which play the key role in photocatalytic activity—can be precisely optimized.
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