Generation of 10W, 1ns Deep Ultraviolet Pulse at 193nm

Deep ultraviolet (DUV) lasers are actively used for semiconductor lithography. Argon fluoride excimer laser (ArF excimer laser) is the typical light source which can generate above 100-W optical power at the wavelength of below 200-nm with several tens of nanoseconds pulse duration. Using all-solid-state DUV light source as a seed laser and amplifying by ArF excimer (hybrid laser), both high average power and low power consumption can be realized in the DUV region [1]. In addition, the ArF hybrid laser can generate the high beam quality pulse with short pulse duration which is suitable for precise micromachining applications. We are developing a hundred-watt class short pulse hybrid laser at the wavelength of 193-nm.