材料科学
透射电子显微镜
扫描电子显微镜
表征(材料科学)
化学工程
氧化物
纳米技术
氧气
钨
多孔性
纳米颗粒
蚀刻(微加工)
化学气相沉积
形态学(生物学)
冶金
复合材料
化学
有机化学
图层(电子)
生物
工程类
遗传学
作者
Yang Zhiguang,Chaosheng Zhu,Zhiqiang Hou,Peng Peng
出处
期刊:Materials Express
[American Scientific Publishers]
日期:2019-10-01
卷期号:9 (7): 773-777
被引量:5
标识
DOI:10.1166/mex.2019.1567
摘要
WO 3 is an essential material for energy storage and catalytical technology, the oxygen vacancies level will play an essential role in its potential application. In this paper, porous tungsten oxide (WO 3– x ) with various oxygen contents was quickly fabricated by a microwave plasma-enhanced chemical vapor deposition method. A detailed characterization of structure and morphology features with the plasma handling process was recorded by X-ray diffraction, field-emission scanning electron microscopy and transmission electron microscopy, respectively. The etching mechanism of porous WO 3– x under H 2 plasma was discussed based on the systemically characterization. These results will help us to design the active sites or structure in the metal oxide materials.
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