分子束外延
材料科学
外延
纳米技术
图层(电子)
作者
Sushma Raghuvansy,Jonathan P. McCandless,Marco Schowalter,Alexander Karg,Manuel Alonso‐Orts,Martin S. Williams,Christian Tessarek,S. Figge,Kazuki Nomoto,Huili Grace Xing,Darrell G. Schlom,Andreas Rosenauer,Debdeep Jena,Martin Eickhoff,Patrick Vogt
出处
期刊:APL Materials
[American Institute of Physics]
日期:2024-01-01
卷期号:12 (1)
摘要
Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation Sushma Raghuvansy, Jon P. McCandless, Marco Schowalter, Alexander Karg, Manuel Alonso-Orts, Martin S. Williams, Christian Tessarek, Stephan Figge, Kazuki Nomoto, Huili Grace Xing, Darrell G. Schlom, Andreas Rosenauer, Debdeep Jena, Martin Eickhoff, Patrick Vogt; Erratum: “Growth of β-Ga2O3 and ε/κ-Ga2O3 on AlN(0001) by molecular-beam epitaxy” [APL Mater. 11, 111113 (2023)]. APL Mater. 1 January 2024; 12 (1): 019902. https://doi.org/10.1063/5.0192370 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAIP Publishing PortfolioAPL Materials Search Advanced Search |Citation Search
科研通智能强力驱动
Strongly Powered by AbleSci AI