A Brief Review on Commonly Used Metal ALD Precursors for Semiconductor from A Structural Chemistry Perspective

This review succinctly examines a few commonly used ALD metalorganic precursors, highlighting their physical and deposition properties. Precursors with similar molecular structures are compared. This concise analysis aims to elucidate the correlations between molecular structure and functional characteristics of ALD precursors, providing insights for their application in thin film deposition.