材料科学
薄膜
欧姆接触
异质结
电流密度
电介质
电容器
肖特基效应
电容
分析化学(期刊)
肖特基势垒
空间电荷
铁电性
泄漏(经济)
普尔-弗伦克尔效应
光电子学
肖特基二极管
电极
图层(电子)
纳米技术
电压
电气工程
化学
电子
工程类
经济
物理化学
宏观经济学
物理
二极管
量子力学
色谱法
作者
Yu Tong,Yun Liu,Binbin Huang,Xiaoyang Chen,Ping Yu
出处
期刊:AIP Advances
[American Institute of Physics]
日期:2022-12-01
卷期号:12 (12)
被引量:1
摘要
Ferroelectric (FE) multilayer heterostructure films have attracted significant attention due to their superior dielectric performance, which shows increasing opportunities in the application of energy storage capacitors or high-capacitance density systems. However, the leakage current density in FE multilayer heterostructure thin films is closely linked to the thickness of each single FE layer and the number of hetero-structure interfaces. In Pt/[LaNiO3/Ba0.67Sr0.33TiO3]3 (Pt/[LNO/BST]3) multilayer thin films, the dominant leakage current mechanism is Poole–Frenkel (PF) emission at room temperature. The space charge limited current (SCLC) and the co-dominated leakage current mechanism from the PF and Schottky (SC) emissions were observed under higher operating temperatures. After inserting an ultrathin SrTiO3 (STO) layer between the Pt/[LNO/BST]3 multilayer thin films and the top Au electrode, the SCLC region was replaced by an Ohmic region, and the SC emission was not detected in the temperature range of 288–368 K. Moreover, the calculated zero-field energy barriers ϕPF of PF emission are higher than the prepared multilayer thin films without the STO layer. Consequently, the leakage current density of Pt/[LNO/BST]3 thin films showed a significant decrease.
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