High-Entropy Films by Magnetron Sputtering: Deposition Parameters, Oxidation Resistance Enhancement, and Applications

Coatings play a key role in modern industry, enhancing the performance of materials. The diversity of their applications and constant progress make them a central area of research and development in materials science and engineering. In this manuscript, we examined some recent works of high-entropy coatings deposited by magnetron sputtering. The first section provides details on the magnetron sputtering technique and deposition mechanism. The change of the parameter influences the microstructure and then the properties of the films. High Power Impulse Magnetron Sputtering is sued to increase the compactness of the film. In the second, a spotlight on High-Entropy Films (HEFs) as an emergent-class material is presented and how their oxidation resistance is improved. Particular attention is being paid to studying the effect of some alloying elements, such as nitrogen and silicon, on oxidation resistance improvement. The last section presents potential applications of these coatings, especially the cutting tools, the diffusion barrier, and other industrial uses.