肖特基势垒
工作职能
材料科学
费米能级
肖特基二极管
肖特基效应
凝聚态物理
图层(电子)
氧气
金属半导体结
带隙
工作(物理)
阻挡层
热传导
电接点
相(物质)
化学物理
矩形势垒
金属
化学反应
化学
宽禁带半导体
电子能带结构
导带
同种类的
耗尽区
过渡金属
作者
Fan Ye,Qian Gao,Zi-Cheng Zhao,Jian-Lin Liang,Yizhu Xie,Dong-Ping Zhang,Xing‐Min Cai
摘要
To reveal the formation mechanism of Schottky barrier heights, inter-diffusion and chemical reaction between ZnSnN2 and the metals (Cu or Ag) are studied. Nitrogen and selective cation out-diffusion are observed, besides stronger Cu and weaker Ag in-diffusion. The Schottky barrier heights are consistent with the Schottky–Mott theory based on the improved work functions of ZnSnN2 layers and metals due to oxygen contamination. The Fermi level is pinned at about 1/3 of the forbidden bandgap below the conduction band bottom. Each layer in ZnSnN2\Ag is electronically homogeneous with the chemical reaction limited to the interface region. The ZnSnN2 layer in ZnSnN2\Cu is bulk inhomogeneous with one smaller work function from the minor phase resulting from Cu in-diffusion and suppressed oxygen out-diffusion besides the larger one from the original major phase, while the Cu layer is also bulk inhomogeneous, resulting from the higher chemical activity of Cu, which leads to the observed barrier height inhomogeneity and quenches the photovoltaic effect.
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