Monolayer transition metal dichalcogenide and black phosphorus transistors for low power robust SRAM design
作者
Joydeep Rakshit,Runlai Wan,Kai Tak Lam,Jing Hua Guo,Kartik Mohanram
出处
期刊:Proceedings [Association for Computing Machinery] 日期:2015-06-02卷期号:: 1-6被引量:1
标识
DOI:10.1145/2744769.2744872
摘要
Vertical monolayer heterojunction FETs based on transition metal dichalcogenides (TMDCFETs) and planar black phosphorus FETs (BPFETs) have demonstrated excellent sub-threshold swing, high ION/IOFF, and high scalability, making them attractive candidates for post-CMOS memory design. This paper explores TMDCFET and BPFET SRAM design by combining atomistic self-consistent device modeling with SRAM circuit design and simulation. Our simulations show that at low operating voltages, TMDCFET and BPFET SRAMs exhibit significant advantages in static power, dynamic read/write noise margin, and read/write delay over both nominal and read/write-assisted 16nm CMOS SRAMs.