电介质
介电强度
随时间变化的栅氧化层击穿
电场
凝聚态物理
高-κ电介质
材料科学
常量(计算机编程)
破损
领域(数学)
化学
复合材料
物理
栅极电介质
光电子学
电压
量子力学
计算机科学
数学
晶体管
程序设计语言
纯数学
作者
J. W. McPherson,J. Y. Kim,A. Shanware,H. C. Mogul
摘要
A thermochemical/molecular model is developed for breakdown in high dielectric constant materials and the model suggests that a fundamental relationship exists between dielectric breakdown strength (Ebd) and dielectric constant (k). The model indicates that Ebd should show an approximate (k)−1/2 dependence over a wide range of high dielectric constant materials. The model also predicts that the field-acceleration parameter (γ), from time-dependent dielectric breakdown (TDDB) testing, should increase with dielectric constant. TDDB and Ebd data are presented for model support. The thermochemical model suggests that the very high local electric field (Lorentz-relation/Mossotti-field) in high-k dielectrics tends to distort/weaken the polar molecular bonds making them more susceptible to bond breakage by standard Boltzmann processes and/or by hole capture and thus lowers the breakdown strength.
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