掺杂剂
磁性半导体
兴奋剂
离子
材料科学
半导体
格子(音乐)
过渡金属
替代(逻辑)
结晶学
锌
宽禁带半导体
凝聚态物理
无机化学
化学物理
化学
冶金
物理
光电子学
催化作用
有机化学
生物化学
程序设计语言
计算机科学
声学
作者
L. M. C. Pereira,U. Wahl,J. G. Correia,L. M. Amorim,D. J. Silva,E. David-Bosne,Stefan Decoster,M. R. da Silva,K. Temst,A. Vantomme
摘要
We report on the lattice location of implanted Ni in ZnO using the β− emission channeling technique. In addition to the majority substituting for the cation (Zn), a significant fraction of the Ni atoms occupy anion (O) sites. Since Ni is chemically more similar to Zn than it is to O, the observed O substitution is rather puzzling. We discuss these findings with respect to the general understanding of lattice location of dopants in compound semiconductors. In particular, we discuss potential implications on the magnetic behavior of transition metal doped dilute magnetic semiconductors.
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