Synthesis and Characterization of Co<sub>3</sub>O<sub>4</sub> Thin Film

材料科学 退火(玻璃) 纳米晶材料 薄膜 微晶 带隙 旋涂 电阻率和电导率 扫描电子显微镜 分析化学(期刊) 吸收光谱法 尖晶石 光谱学 粒度 能量色散X射线光谱学 相(物质) 电导率 直接和间接带隙 碳膜 电子迁移率 光电子学
作者
Vikas Patil Patil,Pradeep Joshi,M. A. Chougule,Shashwati Sen
出处
期刊:Soft nanoscience letters [Scientific Research Publishing, Inc.]
卷期号:02 (01): 1-7 被引量:132
标识
DOI:10.4236/snl.2012.21001
摘要

Nanosized Co3O4 thin films were prepared on glass substrates by using sol-gel spin coating technique. The effect of annealing temperature (400°C - 700°C) on structural, morphological, electrical and optical properties of Co3O4 thin films were studied by X-ray diffraction (XRD), Scanning Electron Microscopy (SEM), Electrical conductivity and UV-visible Spectroscopy (UV-Vis). XRD measurements show that all the films are nanocrystallized in the cubic spinel structure and present a random orientation. Six prominent peaks, corresponding to the (111) phase (2θ ≈ 18.90°), (220) phase (2θ ≈ 31.29°), (311) phase (2θ ≈ 36.81°), (222) phase (2θ ≈ 38.54°), (400) phase (2θ ≈ 44.80°), (511) phase (2θ ≈ 59.37°) and (440) phase (2θ ≈ 65.27°) appear on the diffractograms. The crystallite size increases with increasing annealing temperature. These modifications influence the optical properties. The morphology of the sol gel derived Co3O4 shows nanocrystalline grains with some overgrown clusters and it varies with annealing temperature. The optical band gap has been determined from the absorption coefficient. We found that the optical band gap energy decreases from 2.58 eV to 2.07 eV with increasing annealing temperature between 400°C - 700°C. These mean that the optical quality of Co3O4 films is improved by annealing. The dc electrical conductivity of Co3O4 thin films were increased from 10–4 to 10–2 (Ω.cm)–1 with increase in annealing temperature. The electron carrier concentration (n) and mobility (μ) of Co3O4 films annealed at 400°C - 700°C were estimated to be of the order of 2.4 to 4.5 × 1019 cm–3 and 5.2 to 7.0 × 10–5 cm2.V–1.s–1 respectively. It is observed that Co3O4 thin film annealing at 700°C after deposition provide a smooth and flat texture suited for optoelectronic applications.
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