Electrical properties and defect analysis of MAPbI3 thin films grown on TiO2 layer through a two-step drying process

We studied the electrical properties and defect states of methylammonium lead iodide perovskite (MAPbI3) thin film grown onto the TiO2 layer at a temperature of 120 °C via a two-step drying process. The TiO2 layer with thickness of 20 nm were formed on fluorine doped tin oxide/glass at 120 °C via atomic layer deposition. The MAPbI3 thin film showed α-phase structure with band gap energy of about 1.61 eV. For the MAPbI3/TiO2 with Ag top and bottom electrodes, the resistance switching phenomena were enhanced compared to the MAPbI3 film without the TiO2 layer. In the MAPbI3/TiO2, two deep level states of E1(Ec-0.38 eV) and H2 (Ev+0.82 eV) appeared from deep level transient spectroscopy measurements. The defect states of E1 and H2 are related to iodine interstitial (Ii) and iodine antisite (IPb), respectively. In the MAPbI3/TiO2, the defect of Ii appeared as the ionized states of Ii+ or Ii−, so that it was found that the defect state of Ii caused the MAPbI3/TiO2 to have the resistance random access memory property by the migration of the ionized states.